Invention Grant
- Patent Title: Resistor element and method of manufacturing the same
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Application No.: US14953940Application Date: 2015-11-30
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Publication No.: US09824798B2Publication Date: 2017-11-21
- Inventor: Jung Min Nam , Jea Hoon Lee , Young Key Kim , Hae In Kim
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2014-0180322 20141215
- Main IPC: H01C1/012
- IPC: H01C1/012 ; H01C1/142 ; H01C1/01 ; H01C17/00 ; H01C17/28

Abstract:
A resistor element includes a base substrate, a resistor layer disposed on one surface of the base substrate, a first electrode layer and a second electrode layer disposed on the resistor layer spaced apart from each other, a third electrode layer disposed between the first electrode layer and the second electrode layer to be spaced apart from the first electrode layer and the second electrode layer and being thicker than each of the first electrode layer and the second electrode layer, and first to third plating layers disposed on the first to third electrode layers, respectively.
Public/Granted literature
- US20160172084A1 RESISTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-06-16
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