Invention Grant
- Patent Title: Schottky barrier diode and method for manufacturing the same
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Application No.: US14975961Application Date: 2015-12-21
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Publication No.: US09825123B2Publication Date: 2017-11-21
- Inventor: Tatsuji Nagaoka , Hiroki Miyake , Yukihiko Watanabe , Sachiko Aoi , Atsuya Akiba
- Applicant: Toyota Jidosha Kabushiki Kaisha , Denso Corporation
- Applicant Address: JP Toyota-shi JP Kariya-shi
- Assignee: Toyota Jidosha Kabushiki Kaisha,Denso Corporation
- Current Assignee: Toyota Jidosha Kabushiki Kaisha,Denso Corporation
- Current Assignee Address: JP Toyota-shi JP Kariya-shi
- Agency: Dinsmore & Shohl LLP
- Priority: JP2014-259316 20141222
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/16 ; H01L29/872 ; H01L29/66

Abstract:
A Schottky barrier diode provided herein includes: a semiconductor substrate; and an anode electrode being in contact with the semiconductor substrate. The semiconductor substrate includes: p-type contact regions being in contact with the anode electrode; and an n-type drift region being in contact with the anode electrode by Schottky contact in a range where the p-type contact regions are not provided The p-type contact regions includes: a plurality of circular regions located so that the circular regions are arranged at intervals between an outer side and an inner side at a contact surface between the semiconductor substrate and the anode electrode; and an internal region located in an inner portion of the circular region located on an innermost side at the contact surface and connected to the circular region located on the innermost side at the contact surface.
Public/Granted literature
- US20160181355A1 SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-06-23
Information query
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