Invention Grant
- Patent Title: Semiconductor element and method for producing the same
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Application No.: US14219874Application Date: 2014-03-19
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Publication No.: US09825137B2Publication Date: 2017-11-21
- Inventor: Youngjae Kim
- Applicant: MagnaChip Semiconductor, Ltd.
- Applicant Address: KR Cheongju-si
- Assignee: Magnachip Semiconductor, Ltd.
- Current Assignee: Magnachip Semiconductor, Ltd.
- Current Assignee Address: KR Cheongju-si
- Agency: NSIP Law
- Priority: KR10-2013-0109440 20130912
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/78 ; H01L21/28 ; H01L29/423 ; H01L29/06

Abstract:
A semiconductor element and a method for producing the same are provided. A semiconductor element includes an active region comprising trenches, a termination region outside the active region, a transient region disposed between the active region and the termination region, the transient region including an inside trench, in which a center poly electrode is disposed inside at least one of the trenches of the active region, at least two gate poly electrodes are disposed adjacent to an upper portion of the center poly electrode, a p-body region is disposed between upper portions of the trenches, and a source region is disposed at a side of the gate poly electrodes.
Public/Granted literature
- US20150069536A1 SEMICONDUCTOR ELEMENT AND METHOD FOR PRODUCING THE SAME Public/Granted day:2015-03-12
Information query
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