Invention Grant
- Patent Title: B2-MTJ design with texture blocking decoupling layer for sub-25 nm STT-MRAM
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Application No.: US15080576Application Date: 2016-03-24
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Publication No.: US09825220B2Publication Date: 2017-11-21
- Inventor: Dmytro Apalkov , Xueti Tang , Dustin Erickson , Vladimir Nikitin , Roman Chepulskyy
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/12 ; H01L43/08 ; G11C11/16

Abstract:
A magnetic tunnel junction device and a method to make the device are disclosed. The magnetic tunnel junction device comprises a first reference magnetic material layer, a tunnel barrier material layer, a free magnetic material layer between the first reference magnetic material layer and the tunnel barrier material layer, and a second reference magnetic material layer disposed on an opposite side of the tunnel barrier material layer from the free magnetic material layer, in which the second reference magnetic material layer is anti-magnetically exchanged coupled with the first reference magnetic material layer. A shift field Hshift experienced by the free magnetic material layer is substantially canceled by the anti-magnetic exchange coupling between the first reference magnetic material layer and the second reference magnetic material layer.
Public/Granted literature
- US20170141156A1 B2-MTJ DESIGN WITH TEXTURE BLOCKING DECOUPLING LAYER FOR SUB-25 NM STT-MRAM Public/Granted day:2017-05-18
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