Invention Grant
- Patent Title: Method for producing quantum cascade laser and quantum cascade laser
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Application No.: US15372346Application Date: 2016-12-07
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Publication No.: US09825430B2Publication Date: 2017-11-21
- Inventor: Yukihiro Tsuji
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2015-241211 20151210
- Main IPC: H01S5/34
- IPC: H01S5/34 ; H01S5/227 ; H01S5/12

Abstract:
A method for producing a quantum cascade laser includes the steps of growing a stacked semiconductor layer including a core layer; forming an insulating mask on the stacked semiconductor layer; forming a mesa structure including the core layer by etching the stacked semiconductor layer through the insulating mask; growing a buried layer on a side surface of the mesa structure using the insulating mask by supplying a halogen-based substance and a gas containing a raw material, the buried layer having a thickness larger than a height of the mesa structure; producing a substrate product including the mesa structure and a buried region by processing of the buried layer using a chemical-mechanical polishing method; and after removal of the insulating mask, producing a distributed reflection structure by etching the mesa structure and the buried region of the substrate product using a mask.
Public/Granted literature
- US20170170634A1 METHOD FOR PRODUCING QUANTUM CASCADE LASER AND QUANTUM CASCADE LASER Public/Granted day:2017-06-15
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