Invention Grant
- Patent Title: Semiconductor device and method for manufacturing same
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Application No.: US15268034Application Date: 2016-09-16
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Publication No.: US09831180B2Publication Date: 2017-11-28
- Inventor: Masao Shingu , Kenta Yamada , Masaaki Higuchi , Daigo Ichinose
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L21/20 ; H01L23/528 ; H01L27/1157 ; H01L27/11582 ; H01L23/522 ; H01L21/768

Abstract:
According to the embodiment, the semiconductor device includes: a substrate; a stacked body; and a plurality of columnar portions. The stacked body is provided on the substrate. The stacked body includes a plurality of electrode layers stacked with an insulator interposed. The stacked body includes a stacked portion and a staircase portion. The plurality of electrode layers includes a first portion and a second portion. The columnar portions are provided in the stacked portion of the stacked body. The columnar portions extend in a stacking direction of the stacked body. The columnar portions include a semiconductor body extending in the stacking direction and a charge storage film. The second portion includes a third portion. A thickness of the third portion along the stacking direction is thinner than a thickness of the first portion along the stacking direction.
Public/Granted literature
- US20170263558A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2017-09-14
Information query
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