Invention Grant
- Patent Title: Optical component made of quartz glass for use in ArF excimer laser lithography and method for producing the component
-
Application No.: US14769382Application Date: 2014-02-19
-
Publication No.: US09834468B2Publication Date: 2017-12-05
- Inventor: Bodo Kuehn
- Applicant: Heraeus Quarzglas GmbH & Co. KG
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: DE102013101687 20130220
- International Application: PCT/EP2014/053199 WO 20140219
- International Announcement: WO2014/128148 WO 20140828
- Main IPC: F21V9/00
- IPC: F21V9/00 ; G02B5/02 ; G02C7/10 ; G02F1/361 ; G03B11/00 ; C03C3/06 ; C03B19/14 ; C03B32/00 ; G02B1/00 ; G02B1/02 ; C03B32/02 ; C03C4/04 ; C03C15/00

Abstract:
An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.
Public/Granted literature
Information query