Invention Grant
- Patent Title: Cleaning formulations for removing residues on surfaces
-
Application No.: US14485947Application Date: 2014-09-15
-
Publication No.: US09834746B2Publication Date: 2017-12-05
- Inventor: Thomas Dory , Bing Du , Tomonori Takahashi , Emil A. Kneer
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C11D3/26
- IPC: C11D3/26 ; C11D3/28 ; C11D3/33 ; C11D3/43 ; C11D11/00 ; C11D7/50 ; C11D7/32 ; C11D3/20 ; G03F7/42 ; C11D3/00 ; H01L21/02
Abstract:
This disclosure relates to a cleaning composition that contains 1) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one monocarboxylic acid containing a primary or secondary amino group and at least one additional basic group containing nitrogen; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
Public/Granted literature
- US20150111804A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES Public/Granted day:2015-04-23
Information query
