Invention Grant
- Patent Title: Group III nitride bulk crystals and fabrication method
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Application No.: US14598982Application Date: 2015-01-16
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Publication No.: US09834863B2Publication Date: 2017-12-05
- Inventor: Tadao Hashimoto , Edward Letts
- Applicant: SIXPOINT MATERIALS, INC. , SEOUL SEMICONDUCTOR CO., LTD.
- Applicant Address: US CA Buelton KR Ansan-si
- Assignee: SixPoint Materials, Inc.,Seoul Semiconductor Co., Ltd.
- Current Assignee: SixPoint Materials, Inc.,Seoul Semiconductor Co., Ltd.
- Current Assignee Address: US CA Buelton KR Ansan-si
- Agency: Strategic Innovation IP Law Offices, P.C.
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C30B7/10

Abstract:
Bulk crystal of group III nitride having thickness greater than 1 mm with improved crystal quality, reduced lattice bowing and/or reduced crack density and methods of making. Bulk crystal has a seed crystal, a first crystalline portion grown on the first side of the seed crystal and a second crystalline portion grown on the second side of the seed crystal. Either or both crystalline portions have an electron concentration and/or an oxygen concentration similar to the seed crystal.The bulk crystal can have an additional seed crystal, with common faces (e.g. same polarity, same crystal plane) of seed crystals joined so that a first crystalline part grows on the first face of the first seed crystal and a second crystalline part grows on the first face of the second seed crystal. Each crystalline part's electron concentration and/or oxygen concentration may be similar to its corresponding seed crystal.
Public/Granted literature
- US20150203991A1 GROUP III NITRIDE BULK CRYSTALS AND FABRICATION METHOD Public/Granted day:2015-07-23
Information query
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