Invention Grant
- Patent Title: Liquid metal interconnects
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Application No.: US13173933Application Date: 2011-06-30
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Publication No.: US09835648B2Publication Date: 2017-12-05
- Inventor: Rajashree Baskaran , Kimin Jun , Ting Zhong , Roy E. Swart , Paul B. Fischer
- Applicant: Rajashree Baskaran , Kimin Jun , Ting Zhong , Roy E. Swart , Paul B. Fischer
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe Williamson & Wyatt P.C.
- Main IPC: G01R31/28
- IPC: G01R31/28 ; G01R1/04 ; H01R3/08 ; G01R1/067

Abstract:
Embodiments of the invention provide methods for forming electrical connections using liquid metals. Electrical connections that employ liquid metals are useful for testing and validation of semiconductor devices. Electrical connections are formed between the probes of a testing interface and the electronic interface of a device under test through a liquid metal region. In embodiments of the invention, liquid metal interconnects are comprised of gallium or liquid metal alloys of gallium. The use of liquid metal contacts does not require a predetermined amount of force be applied in order to reliably make an electrical connection.
Public/Granted literature
- US20130000117A1 LIQUID METAL INTERCONNECTS Public/Granted day:2013-01-03
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