Invention Grant
- Patent Title: Self-organization material and pattern formation method
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Application No.: US15256990Application Date: 2016-09-06
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Publication No.: US09835947B2Publication Date: 2017-12-05
- Inventor: Yuriko Seino , Naoko Kihara
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2015-180040 20150911
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/11 ; G03F7/16 ; C09D153/00 ; C09D183/10 ; C09D133/12 ; G03F7/00 ; G03F7/40 ; H01L21/311 ; H01L21/306 ; H01L21/02 ; H01L21/027 ; B81C1/00 ; B82Y40/00 ; B82Y30/00 ; C08G77/44
Abstract:
A self-organization material according to an embodiment includes a block copolymer and a top coat material. The block copolymer contains a first block and a second block. The second block has a surface free energy higher than that of the first block. The top coat material contains a first portion having a surface free energy higher than that of the first block and lower than that of the second block, and a second portion having a surface free energy lower than that of the first block. The first portion is one of a homopolymer miscible with both the first block and the second block, and a random copolymer having a repeating unit of the first block and a repeating unit of the second block. The second portion is one of an organic siloxane-containing polymer and a fluorine-containing polymer.
Public/Granted literature
- US20170073542A1 SELF-ORGANIZATION MATERIAL AND PATTERN FORMATION METHOD Public/Granted day:2017-03-16
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