Invention Grant
- Patent Title: Electrically conductive thin films
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Application No.: US14940223Application Date: 2015-11-13
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Publication No.: US09837179B2Publication Date: 2017-12-05
- Inventor: Kimoon Lee , Sang Il Kim , Se Yun Kim , Sung Woo Hwang , Woojin Lee , Hee Jung Park , Yoon Chul Son , Hyosug Lee , Doh Won Jung , Youngjin Cho , Jae-Young Choi
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Cantor Colburn LLP
- Priority: KR10-2014-0158848 20141114
- Main IPC: H01B1/02
- IPC: H01B1/02 ; H01B1/06 ; C30B29/60 ; C30B7/00 ; C01B19/00 ; C30B29/46 ; H01L21/02

Abstract:
An electrically conductive thin film including: a material including a compound represented by Chemical Formula 1 and having a layered crystal structure, MemAa Chemical Formula 1 wherein Me is Al, Ga, In, Si, Ge, Sn, A is S, Se, Te, or a combination thereof, and m and a each are independently a number selected so that the compound of Chemical Formula 1 is neutral; and a dopant disposed in the compound of Chemical Formula 1, wherein the dopant is a metal dopant that is different from Me and has an oxidation state which is greater than an oxidation state of Me, a non-metal dopant having a greater number of valence electrons than a number of valence electrons of A in Chemical Formula 1, or a combination thereof, and wherein the compound of Chemical Formula 1 includes a chemical bond which includes a valence electron of an s orbital of Me.
Public/Granted literature
- US20160141067A1 ELECTRICALLY CONDUCTIVE THIN FILMS Public/Granted day:2016-05-19
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