Invention Grant
- Patent Title: Thin film capacitor
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Application No.: US15006632Application Date: 2016-01-26
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Publication No.: US09837211B2Publication Date: 2017-12-05
- Inventor: Hitoshi Saita , Hiroyasu Inoue , Yoshihiko Yano
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015-012177 20150126
- Main IPC: H01G4/06
- IPC: H01G4/06 ; H01G4/30 ; H01G4/12 ; H01G4/008 ; C04B35/00 ; H01G4/33

Abstract:
A thin film capacitor comprises a base material, a dielectric layer provided on the base material, and an upper electrode layer provided on the dielectric layer. The dielectric layer includes a plurality of columnar crystals that extend along a normal direction with respect to a surface of the upper electrode layer. The columnar crystal has a perovskite crystal structure represented by AyBO3. An element A is at least one of Ba, Ca, Sr, and Pb, and an element B is at least one of Ti, Zr, Sn, and Hf. Further, y≦0.995 is satisfied, and the dielectric layer contains 0.05 to 2.5 mol of Mg per 100 mol of AyBO3.
Public/Granted literature
- US20160217925A1 THIN FILM CAPACITOR Public/Granted day:2016-07-28
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