Invention Grant
- Patent Title: Ion pump and charged particle beam device using the same
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Application No.: US15015930Application Date: 2016-02-04
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Publication No.: US09837243B2Publication Date: 2017-12-05
- Inventor: Keigo Kasuya , Takeshi Kawasaki , Takashi Ohshima , Souichi Katagiri
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2015-022126 20150206
- Main IPC: H01J41/20
- IPC: H01J41/20 ; H01J37/18

Abstract:
An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.
Public/Granted literature
- US20160233050A1 ION PUMP AND CHARGED PARTICLE BEAM DEVICE USING THE SAME Public/Granted day:2016-08-11
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