Invention Grant
- Patent Title: Plating method, plating system and storage medium
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Application No.: US14384861Application Date: 2013-02-22
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Publication No.: US09837308B2Publication Date: 2017-12-05
- Inventor: Nobutaka Mizutani , Takashi Tanaka , Yuichiro Inatomi , Yusuke Saito , Mitsuaki Iwashita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2012-072328 20120327
- International Application: PCT/JP2013/054505 WO 20130222
- International Announcement: WO2013/145979 WO 20131003
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/288 ; C23C18/18 ; C23C18/16 ; C23C18/38 ; C23C14/02 ; C23C16/02 ; C23C28/00 ; C23C14/24 ; C23C14/04 ; C23C16/04

Abstract:
A plating method can improve adhesivity with a substrate. The plating method of performing a plating process on the substrate includes forming a vacuum-deposited layer 2A on the substrate 2 by performing a vacuum deposition process on the substrate 2; forming an adhesion layer 21 and a catalyst adsorption layer 22 on the vacuum-deposited layer 2A of the substrate 2; and forming a plating layer stacked body 23 having a first plating layer 23a and a second plating layer 23b which function as a barrier film on the catalyst adsorption layer 22 of the substrate 2. By forming the vacuum-deposited layer 2A, a surface of the substrate 2 can be smoothened, so that the vacuum-deposited layer 2A serving as an underlying layer can improve the adhesivity.
Public/Granted literature
- US20150079785A1 PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM Public/Granted day:2015-03-19
Information query
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