Invention Grant
- Patent Title: Anneal techniques for chalcogenide semiconductors
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Application No.: US15137275Application Date: 2016-04-25
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Publication No.: US09837574B2Publication Date: 2017-12-05
- Inventor: Sunit S. Mahajan , Teodor K. Todorov
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Vazken Alexanian
- Agent Michael J. Chang, LLC
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/032 ; C23C14/06 ; C23C14/24 ; C23C16/455 ; C23C16/46 ; C23C16/52

Abstract:
Techniques for precisely controlling the composition of volatile components (such as sulfur (S), selenium (Se), and tin (Sn)) of chalcogenide semiconductors in real-time—during production of the material are provided. In one aspect, a method for forming a chalcogenide semiconductor material includes providing a S source(s) and a Se source(s); heating the S source(s) to form a S-containing vapor; heating the Se source(s) to form a Se-containing vapor; passing a carrier gas first through the S-containing vapor and then through the Se-containing vapor, wherein the S-containing vapor and the Se-containing vapor are transported via the carrier gas to a sample; and contacting the S-containing vapor and the Se-containing vapor with the sample under conditions sufficient to form the chalcogenide semiconductor material. A multi-chamber processing apparatus is also provided.
Public/Granted literature
- US20160237561A1 Anneal Techniques for Chalcogenide Semiconductors Public/Granted day:2016-08-18
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