- Patent Title: Metallic dielectric photonic crystals and methods of fabrication
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Application No.: US15343030Application Date: 2016-11-03
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Publication No.: US09837953B2Publication Date: 2017-12-05
- Inventor: Jeffrey Brian Chou , Sang-Gook Kim
- Applicant: Jeffrey Brian Chou , Sang-Gook Kim
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Cooley LLP
- Main IPC: G02F1/00
- IPC: G02F1/00 ; G02F1/03 ; H01L31/00 ; H02S10/30 ; C23C16/455 ; C23C14/04 ; C23C14/08 ; G02B1/113 ; H02S40/44 ; B82Y20/00

Abstract:
A metallic-dielectric photonic crystal is formed with a periodic structure defining a plurality of resonant cavities to selectively absorb incident radiation. A metal layer is deposited on the inner surfaces of the resonant cavities and a dielectric material fills inside the resonant cavities. This photonic crystal can be used to selectively absorb broadband solar radiation and then reemit absorbed radiation in a wavelength band that matches the absorption band of a photovoltaic cell. The photonic crystal can be fabricated by patterning a sacrificial layer with a plurality of holes, into which is deposited a supporting material. Removing the rest of the sacrificial layer creates a supporting structure, on which a layer of metal is deposited to define resonant cavities. A dielectric material then fills the cavities to form the photonic crystal.
Public/Granted literature
- US20170070181A1 METALLIC DIELECTRIC PHOTONIC CRYSTALS AND METHODS OF FABRICATION Public/Granted day:2017-03-09
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