Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
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Application No.: US15158848Application Date: 2016-05-19
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Publication No.: US09841679B2Publication Date: 2017-12-12
- Inventor: Masafumi Kojima , Akiyoshi Goto , Akinori Shibuya , Keita Kato , Kei Yamamoto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2013-257496 20131212
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; G03F7/039 ; G03F7/11 ; G03F7/20 ; G03F7/32 ; G03F7/038
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a partial structure represented by General Formula (X), and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
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