Invention Grant
- Patent Title: Method of forming a feature of a target material on a substrate
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Application No.: US15378849Application Date: 2016-12-14
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Publication No.: US09842734B2Publication Date: 2017-12-12
- Inventor: Annelies Delabie , Markus Heyne
- Applicant: IMEC VZW , KATHOLIEKE UNIVERSITEIT LEUVEN, KU LEUVEN R&D
- Applicant Address: BE Leuven BE Leuven
- Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee Address: BE Leuven BE Leuven
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: EP15201632 20151221
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A method is provided for forming a feature of a target material on a substrate. The method including: forming a feature of a sacrificial material on the substrate; and forming the feature of the target material by a deposition process during which the feature of the sacrificial material is removed from the substrate by forming a volatile reaction product with a precursor of the deposition process, wherein the sacrificial material is replaced by the target material and the target material is selectively deposited on surface portions of the substrate, which portions were covered by the feature of the sacrificial material, to form the feature of the target material.
Public/Granted literature
- US20170178905A1 Method of Forming a Feature of a Target Material on a Substrate Public/Granted day:2017-06-22
Information query
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