Invention Grant
- Patent Title: Diode
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Application No.: US15097933Application Date: 2016-04-13
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Publication No.: US09842836B2Publication Date: 2017-12-12
- Inventor: Kohei Makita , Teruhiro Koshiba
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, P.C.
- Priority: JP2015-082797 20150414; JP2015-138030 20150709; JP2016-064131 20160328
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/08 ; H01L29/872 ; H01L29/866 ; H01L29/36 ; H01L29/47 ; H01L29/06

Abstract:
A diode according to the present invention includes a semiconductor layer of a first conductivity type having an impurity concentration of 1×1016 cm−3 to 2.4×1017 cm−3, a Zener diode region of a second conductivity type formed selectively in the semiconductor layer and forming a pn junction with the semiconductor layer, a Schottky metal disposed on the semiconductor layer, forming a Schottky junction with the semiconductor layer, and having a work function of 3 eV to 6 eV, and a JBS (junction barrier Schottky) structure including a plurality of second conductivity type regions formed selectively in the Schottky junction region of the semiconductor layer.
Public/Granted literature
- US20160307893A1 DIODE Public/Granted day:2016-10-20
Information query
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