Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US15216045Application Date: 2016-07-21
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Publication No.: US09842941B2Publication Date: 2017-12-12
- Inventor: Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2013-190136 20130913
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/786 ; H01L29/26 ; H01L29/66 ; C23C16/455 ; C23C16/48 ; G06K19/07 ; H01L27/105 ; H01L27/12 ; H01L29/24 ; G02F1/1343 ; G02F1/1362 ; G02F1/1368 ; H01L27/32

Abstract:
A transistor having high field-effect mobility is provided. A transistor having stable electrical characteristics is provided. A transistor having low off-state current (current in an off state) is provided. Alternatively, a semiconductor device including the transistor is provided. The semiconductor device includes a first insulating film, an oxide semiconductor film over the first insulating film, a second insulating film over the oxide semiconductor film, and a conductive film overlapping with the oxide semiconductor film with the first insulating film or the second insulating film provided between the oxide semiconductor film and the conductive film. The composition of the oxide semiconductor film changes continuously between the first insulating film and the second insulating film.
Public/Granted literature
- US20160329437A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-11-10
Information query
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