Adjustment system for aligning optical elements or samples in vacuum
Abstract:
The invention concerns an adjustment system for aligning optical elements and/or samples in vacuum (3) for projecting electromagnetic radiation in the terahertz range up to the range of hard X-ray radiation, consisting of at least one vacuum chamber (3″), at least one mirror (3′) adjustable in spatial direction and/or at least one optical element adjustable in spatial direction or at least one sample adjustable in spatial direction, with translational actuators (X1, X2, Z1, Z2, Z3) in the undeflected state (idle state) being provided for adjusting the alignment of the at least one mirror (3′) adjustable in spatial direction and/or the at least one optical element adjustable in spatial direction or the at least one sample adjustable in spatial direction in a maximum of three essentially mutually perpendicular spatial directions (X, Y, Z, y, y, z).Pursuant to the invention it is provided that the at least one mirror (3′) adjustable in spatial direction (X, Y, Z, y, y, z) and/or the at least one optical element adjustable in spatial direction (X, Y, Z, y, y, z) or sample within the vacuum chamber (3″) is mounted in a fixed position in relation to the vacuum chamber (3″), with the vacuum chamber (3″) being directly or indirectly connected with the translational actuators (X1, X2, Z1, Z2, Z3) for aligning the spatial position of the mirror and/or the optical element or the sample.This setup facilitates a very compact and small design of the vacuum chamber and achieves a very high precision of the alignment.
Information query
Patent Agency Ranking
0/0