- Patent Title: Substrate processing method including reprocessing rejected wafers
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Application No.: US14668885Application Date: 2015-03-25
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Publication No.: US09847263B2Publication Date: 2017-12-19
- Inventor: Hirofumi Otaki , Tsuneo Torikoshi
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker & Hostetler LLP
- Priority: JP2014-069621 20140328
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66 ; H01L21/306 ; H01L21/67 ; G05B19/418 ; B24B37/04

Abstract:
A substrate processing method which can increase the yield by reprocessing a substrate whose processing has been interrupted by a processing interruption command during a substrate processing is disclosed. A substrate processing method performs a predetermined processing of a substrate while sequentially transporting the substrate to a plurality of processing sections according to a preset recipe. The substrate processing method includes processing a substrate in one of the processing sections; interrupting the processing of the substrate by a processing interruption command during processing of the substrate; setting the substrate whose processing has been interrupted in a standby state; and customizing the recipe and performing reprocessing of the processing-interrupted substrate according to the customized recipe, or performing reprocessing of the processing-interrupted substrate according to a preset recipe for reprocessing.
Public/Granted literature
- US20150279751A1 SUBSTRATE PROCESSING METHOD Public/Granted day:2015-10-01
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