Invention Grant
- Patent Title: Resistive switching in memory cells
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Application No.: US14591170Application Date: 2015-01-07
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Publication No.: US09853212B2Publication Date: 2017-12-26
- Inventor: D. V. Nirmal Ramaswamy , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/112 ; H01L45/00

Abstract:
Methods, devices, and systems associated with oxide based memory can include a method of forming a resistive switching region of a memory cell. Forming a resistive switching region of a memory cell can include forming a metal oxide material on an electrode and forming a metal material on the metal oxide material, wherein the metal material formation causes a reaction that results in a graded metal oxide portion of the memory cell.
Public/Granted literature
- US20150137063A1 RESISTIVE SWITCHING IN MEMORY CELLS Public/Granted day:2015-05-21
Information query
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