Invention Grant
- Patent Title: Gas separation membrane with ladder-structured polysilsesquioxane and method for fabricating the same
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Application No.: US14697363Application Date: 2015-04-27
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Publication No.: US09855532B2Publication Date: 2018-01-02
- Inventor: Jong Suk Lee , Seung Sang Hwang , Albert Sung Soo Lee , Sunghwan Park , Sang Hee Park , Sanghyup Lee
- Applicant: Korea Institute of Science and Technology
- Applicant Address: KR Seoul
- Assignee: Korea Institute of Science and Technology
- Current Assignee: Korea Institute of Science and Technology
- Current Assignee Address: KR Seoul
- Agency: NSIP Law
- Priority: KR10-2014-0142855 20141021
- Main IPC: B01D69/12
- IPC: B01D69/12 ; B01D53/22 ; B01D67/00 ; B01D71/70 ; C08G77/18

Abstract:
The present disclosure provides a gas separation membrane using a ladder-structured polysilsesquioxane in which organic functional groups are attached to a long siloxane chain and a method for fabricating the same. In accordance with the present disclosure, a free-standing ladder-structured polysilsesquioxane-based membrane with various functional groups can be fabricated for gas separations. The performance of the gas separation membrane can be controlled through a variety of combinations of the organic functional groups linked to the siloxane chain. In addition, by controlling the molecular structure of the gas separation membrane through mixing of the ladder-structured polysilsesquioxane with an amine compound or conventional glassy or rubbery polymers or through thermal/UV-curing, the permeability and selectivity of the gas separation membrane can be controlled selectively.
Public/Granted literature
- US20160107127A1 GAS SEPARATION MEMBRANE WITH LADDER-STRUCTURED POLYSILSESQUIOXANE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2016-04-21
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