Invention Grant
- Patent Title: Photocurable fluorinated polymer composition
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Application No.: US13399223Application Date: 2012-02-17
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Publication No.: US09856340B2Publication Date: 2018-01-02
- Inventor: Shun Saito , Hiroshi Nishio , Sho Masuda
- Applicant: Shun Saito , Hiroshi Nishio , Sho Masuda
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-191148 20090820
- Main IPC: C08F214/18
- IPC: C08F214/18 ; C08K5/00 ; C08F214/26 ; C08L27/12 ; C08L29/10 ; C08F216/14 ; C08L63/00

Abstract:
To provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance. According to the photocurable fluorinated polymer composition comprising a fluorinated polymer (A) containing polymerized units derived from a fluoroolefin and polymerized units derived from an unsaturated monomer having an oxetanyl group or a substituted oxetanyl group, and a photoreaction initiator (B), of the present invention, it is possible to provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance.
Public/Granted literature
- US20120149798A1 PHOTOCURABLE FLUORINATED POLYMER COMPOSITION Public/Granted day:2012-06-14
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