Invention Grant
- Patent Title: Crystal growth apparatus and manufacturing method of group III nitride crystal
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Application No.: US14853133Application Date: 2015-09-14
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Publication No.: US09856575B2Publication Date: 2018-01-02
- Inventor: Seiji Sarayama , Hirokazu Iwata , Akihiro Fuse
- Applicant: Seiji Sarayama , Hirokazu Iwata , Akihiro Fuse
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD.
- Current Assignee: RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-300446 20051014; JP2005-300550 20051014; JP2005-335108 20051121; JP2005-335170 20051121; JP2005-335430 20051121; JP2005-360174 20051214
- Main IPC: C30B19/02
- IPC: C30B19/02 ; C30B9/12 ; C30B9/00 ; C30B17/00 ; C30B29/40

Abstract:
A crystal growth apparatus comprises a reaction vessel holding a melt mixture containing an alkali metal and a group III metal, a gas supplying apparatus supplying a nitrogen source gas to a vessel space exposed to the melt mixture inside the reaction vessel, a heating unit heating the melt mixture to a crystal growth temperature, and a support unit supporting a seed crystal of a group III nitride crystal inside the melt mixture.
Public/Granted literature
- US20160002818A1 CRYSTAL GROWTH APPARATUS AND MANUFACTURING METHOD OF GROUP III NITRIDE CRYSTAL Public/Granted day:2016-01-07
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