Invention Grant
- Patent Title: Pulling a semiconductor single crystal according to the Czochralski method
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Application No.: US14430868Application Date: 2013-09-17
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Publication No.: US09856576B2Publication Date: 2018-01-02
- Inventor: Michael Hünermann , Thomas Kayser , Walter Lehmann
- Applicant: Heraeus Quarzglas GmbH & Co. KG
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Tiajoloff & Kelly LLP
- Priority: DE102012109181 20120927
- International Application: PCT/EP2013/069234 WO 20130917
- International Announcement: WO2014/048791 WO 20140403
- Main IPC: C30B15/02
- IPC: C30B15/02 ; C30B15/10 ; C30B29/06

Abstract:
In a known method for pulling a semiconductor single crystal according to the Czochralski method, a semiconductor melt is produced in a silica glass crucible and the semiconductor single crystal is pulled from said melt. The inner wall of the silica glass crucible and the exposed melt surface are in contact with one another and with a respective melt atmosphere in the region of a contact zone running radially around the crucible inner wall, and primary oscillations of the melt are triggered in said contact zone. On this basis, in order to provide a method characterized by reduced melt vibrations and in particular by a simple, short accretion process, according to the invention primary oscillations are triggered which differ from one another in their frequency.
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