Invention Grant
- Patent Title: Particle analyzing apparatus
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Application No.: US15364266Application Date: 2016-11-30
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Publication No.: US09857282B2Publication Date: 2018-01-02
- Inventor: Yoshiki Hasegawa , Naoki Takeda , Kazuhiro Koizumi , Takamasa Asano
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2016-013697 20160127
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N15/06 ; G01N21/53 ; G01N21/05 ; G01N15/10 ; G01N21/17 ; G01N1/22

Abstract:
A particle analyzing apparatus including a particle measuring section that measures a number or concentration of particles in a sample gas; a component analyzing section that measures an amount of each component of the particles in the sample gas; a flow path that branches into a first flow path that introduces the sample gas to the particle measuring section and a second flow path that introduces the sample gas to the component analyzing section; a first adjusting section that is provided in the first flow path and dilutes the sample gas with a dilution gas and introduces the diluted sample gas to the particle measuring section to adjust a measurement range of the particle measuring section; and a second adjusting section that is provided in the second flow path and adjusts an introduction time during which the sample gas is introduced to the component analyzing section.
Public/Granted literature
- US20170212030A1 PARTICLE ANALYZING APPARATUS Public/Granted day:2017-07-27
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