Invention Grant
- Patent Title: Semiconductor gas sensor
-
Application No.: US14893062Application Date: 2013-05-23
-
Publication No.: US09857322B2Publication Date: 2018-01-02
- Inventor: Toshiyuki Usagawa
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- International Application: PCT/JP2013/064374 WO 20130523
- International Announcement: WO2014/188563 WO 20141127
- Main IPC: G01N27/12
- IPC: G01N27/12 ; G01N27/414 ; G01N33/00

Abstract:
A semiconductor gas sensor includes a CMOS inverter which is configured by an n-channel field effect transistor having a catalytic gate and a p-channel field effect transistor having the catalytic gate. An input setting gate potential Vin(D) of the CMOS inverter is set to satisfy “Vin(D)=Vtc−ΔVgth” by using the sensor response threshold intensity ΔVgth determined by a concentration of a gas to be detected and a threshold input potential Vtc of the CMOS inverter. Therefore, only by setting the input setting gate potential Vin(D), a warning or an alarm can be issued for the concentration of the gas to be detected. In addition, a temperature compensation of the threshold voltage caused by a MOS structure is reduced regardless of the detection gas by setting a characteristic coefficient βR, a threshold voltage Vtn of the n-channel field effect transistor, and the threshold voltage Vtp of the p-channel field effect transistor so as to satisfy relations “βR=1” and “Vtp=−Vtn”.
Public/Granted literature
- US20160097731A1 SEMICONDUCTOR GAS SENSOR Public/Granted day:2016-04-07
Information query