Invention Grant
- Patent Title: Device to adjust gas concentration in fluids
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Application No.: US14933067Application Date: 2015-11-05
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Publication No.: US09857342B2Publication Date: 2018-01-02
- Inventor: Murthy Tata
- Applicant: Murthy Tata
- Applicant Address: US AZ Chandler
- Assignee: Murthy Tata
- Current Assignee: Murthy Tata
- Current Assignee Address: US AZ Chandler
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01N33/14 ; A23L2/54 ; C12G1/06 ; C12G3/00

Abstract:
A device to adjust concentration of a first gas in a fluid to a target concentration (Cf) is provided. The device includes a container, having a first opening, the container is configured to receive a first volume (VL) of the fluid through the first opening. Wherein the fluid has an initial concentration (Ci) of the first gas and a second volume (VC) of the container is determined based on the initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL), and configured to adjust pressure in the container at a predetermined pressure of the first gas to adjust the first gas concentration in the fluid to the target concentration (Cf); wherein the second volume (VC) and the first volume (VL) are correlated by: V C V L = 1 Φ [ M C f V L + C i C f - 1 ] + 1 in that M is an amount of the first gas required to be introduced in the container to adjust the first gas concentration in the fluid to the target concentration (Cf).
Public/Granted literature
- US20160054278A1 DEVICE TO ADJUST GAS CONCENTRATION IN FLUIDS Public/Granted day:2016-02-25
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