Invention Grant
- Patent Title: Cleaning module, cleaning apparatus and method of cleaning photomask
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Application No.: US14154780Application Date: 2014-01-14
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Publication No.: US09857680B2Publication Date: 2018-01-02
- Inventor: Yi Hsun Pan , Kun-Lung Hsieh
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F7/20

Abstract:
In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
Public/Granted literature
- US20150198875A1 CLEANING MODULE, CLEANING APPARATUS AND METHOD OF CLEANING PHOTOMASK Public/Granted day:2015-07-16
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