An exposure method and apparatus exposes an object with an exposure beam via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A first stage on which the object is held and a second stage are moved relative to each other so that the second stage approaches the first stage that is placed facing the projection optical system, the second stage having an upper surface contactable with a liquid immersion area. The first and second stages that have approached each other are moved with respect to the projection optical system so that the second stage is placed facing the projection optical system instead of the first stage. For relative movement of the first and second stages in the approaching, driving of the first and second stages is controlled based on outer periphery positional information of the first stage.