Invention Grant
- Patent Title: Semiconductor device and method of manufacture
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Application No.: US15157220Application Date: 2016-05-17
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Publication No.: US09859258B2Publication Date: 2018-01-02
- Inventor: Wei-Yu Chen , Tien-Chung Yang , An-Jhih Su , Hsien-Wei Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L25/07 ; H01L25/065 ; H01L23/00 ; H01L23/522 ; H01L23/31 ; H01L25/00 ; H01L21/768 ; H01L21/56 ; H01L49/02

Abstract:
A semiconductor device and a method of manufacture are provided. In particular, a semiconductor device includes a first set of through vias between and connecting a top package and a redistribution layer (RDL), the first set of through vias in physical contact with a molding compound and separated from a die. The semiconductor device also includes a first interconnect structure between and connecting the top package and the RDL, the first interconnect structure separated from the die and from the first set of through vias by the molding compound. The first interconnect structure includes a second set of through vias and at least one integrated passive device.
Public/Granted literature
- US20170338207A1 Semiconductor Device and Method of Manufacture Public/Granted day:2017-11-23
Information query
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