Invention Grant
- Patent Title: Photoelectric conversion device and fabrication method thereof
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Application No.: US14251935Application Date: 2014-04-14
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Publication No.: US09859454B2Publication Date: 2018-01-02
- Inventor: Shunpei Yamazaki , Kazuo Nishi
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2010-028310 20100211
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/028 ; H01L31/077 ; H01L31/046 ; H01L31/0463 ; H01L31/0465 ; H01L21/02

Abstract:
In a thin film photoelectric conversion device fabricated by addition of a catalyst element with the use of a solid phase growth method, defects such as a short circuit or leakage of current are suppressed. A catalyst material which promotes crystallization of silicon is selectively added to a second silicon semiconductor layer formed over a first silicon semiconductor layer having one conductivity type, the second silicon semiconductor layer is partly crystallized by a heat treatment, a third silicon semiconductor layer having a conductivity type opposite to the one conductivity type is stacked, and element isolation is performed at a region in the second silicon semiconductor layer to which a catalyst material is not added, so that a left catalyst material is prevented from being diffused again, and defects such as a short circuit or leakage of current are suppressed.
Public/Granted literature
- US20140220730A1 PHOTOELECTRIC CONVERSION DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2014-08-07
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