Invention Grant
- Patent Title: Micro-device with a cavity
-
Application No.: US14562859Application Date: 2014-12-08
-
Publication No.: US09859818B2Publication Date: 2018-01-02
- Inventor: Greja Johanna Adriana Maria Verheijden , Roel Daamen , Gerhard Koops
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Priority: EP08103686 20080423
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40 ; H02N1/00 ; H01L21/311 ; H01L21/02 ; B81C1/00 ; H01L21/50 ; H01L29/84 ; H01L21/768
Abstract:
A micro-device includes a substrate with a cavity. The cavity is covered with a porous layer that is permeable to vapor hydrofluoric acid (HF) etchant. The micro-device comprises a Microelectromechanical Systems (MEMS) device with a component that is moveable in operational use of the MEMS device. The component is arranged within the cavity.
Public/Granted literature
- US20150091411A1 METHOD OF MANUFACTURING A DEVICE WITH A CAVITY Public/Granted day:2015-04-02
Information query
IPC分类:
