Invention Grant
- Patent Title: Structure and production method therefor
-
Application No.: US13534947Application Date: 2012-06-27
-
Publication No.: US09862138B2Publication Date: 2018-01-09
- Inventor: Hiroyuki Yasukochi
- Applicant: Hiroyuki Yasukochi
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Chip Law Group
- Priority: JP2011-151596 20110708
- Main IPC: B32B3/12
- IPC: B32B3/12 ; B29C64/135 ; B33Y80/00 ; B33Y10/00

Abstract:
A structure including a substrate and a coating material. The substrate includes a plurality of voids and a surface on which at least the plurality of voids are formed, and is formed such that a void ratio of the plurality of voids decreases one of 2-dimensionally and 3-dimensionally from an inner side of the substrate toward an outer side thereof. The coating material is formed on the surface of the substrate.
Public/Granted literature
- US20130011603A1 STRUCTURE AND PRODUCTION METHOD THEREFOR Public/Granted day:2013-01-10
Information query