- Patent Title: Donor substrate for laser induced thermal imaging, method of laser induced thermal imaging and method of manufacturing an organic light emitting display device using the same
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Application No.: US14919613Application Date: 2015-10-21
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Publication No.: US09862220B2Publication Date: 2018-01-09
- Inventor: Jung-Hoon Yeon
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: KR10-2013-0048537 20130430
- Main IPC: B41M5/42
- IPC: B41M5/42 ; B41M5/46 ; H01L51/00

Abstract:
A donor substrate, a method of laser induced thermal imaging, and a method of manufacturing an organic light emitting display device are disclosed. In the method of laser induced thermal imaging, a donor substrate is provided to include a base substrate, a light to heat conversion layer, a transfer layer and a functional layer. The functional layer includes a material radiating an infrared light. The donor substrate is laminated to an acceptor substrate. A laser beam is radiated into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer. A position of the organic layer pattern is observed using an infrared microscope. A laser beam position is adjusted and the donor substrate is separated from the acceptor substrate.
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