Invention Grant
- Patent Title: Deposition mask and method of fabricating the same
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Application No.: US14706691Application Date: 2015-05-07
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Publication No.: US09863037B2Publication Date: 2018-01-09
- Inventor: Yongtack Kim , Jongwoo Kim , Jiyoung Moon , Minho Oh , Yoonhyeung Cho
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2014-0164423 20141124
- Main IPC: B05D5/12
- IPC: B05D5/12 ; C23C14/58 ; C23C14/35 ; C23C14/34 ; C23C16/04 ; C23C14/04 ; H01J37/32

Abstract:
A deposition mask comprises a mask body comprising a plurality of through holes; and a deposition layer formed on external surfaces of the mask body. A method of manufacturing a deposition mask comprises: installing a deposition mask body in a chamber; forming a magnetic field between a plurality of magnet units within the chamber, wherein the deposition mask body is disposed between the magnet units; and applying voltages to first and second sputtering targets comprising a material to generate electric discharge such that particles of the material are sputtered from the first and second sputtering targets and deposited on the deposition mask body, thereby making a deposition mask with a layer of the material. The voltages having different magnitudes are applied to the first and second sputtering targets.
Public/Granted literature
- US20160149133A1 DEPOSITION MASK AND METHOD OF FABRICATING THE SAME Public/Granted day:2016-05-26
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