Invention Grant
- Patent Title: Gallium nitride crystal, group 13 nitride crystal, group 13 nitride crystal substrate, and manufacturing method
-
Application No.: US14708583Application Date: 2015-05-11
-
Publication No.: US09863058B2Publication Date: 2018-01-09
- Inventor: Masahiro Hayashi , Seiji Sarayama , Takashi Satoh , Hiroshi Nambu , Chiharu Kimura , Naoya Miyoshi
- Applicant: Masahiro Hayashi , Seiji Sarayama , Takashi Satoh , Hiroshi Nambu , Chiharu Kimura , Naoya Miyoshi
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD.
- Current Assignee: RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2011-201207 20110914
- Main IPC: C30B29/38
- IPC: C30B29/38 ; C30B9/12 ; C30B29/40

Abstract:
A gallium nitride crystal having a hexagonal crystal structure includes a first region located on an inner side of a cross section intersecting c-axis of the hexagonal crystal structure, and a second region surrounding at least a part of the outer periphery of the first region in the cross section. An emission spectrum of each of the first region and the second region with electron beam or ultraviolet light excitation has a first peak including a band edge emission of gallium nitride and a second peak located in a longer wavelength area than the first peak. A peak intensity of the first peak is smaller than a peak intensity of the second peak in the first region, and a peak intensity of the first peak is greater than a peak intensity of the second peak in the second region.
Public/Granted literature
Information query
IPC分类: