Invention Grant
- Patent Title: Method for manufacturing single crystal
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Application No.: US15036095Application Date: 2014-11-12
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Publication No.: US09863060B2Publication Date: 2018-01-09
- Inventor: Yuuichi Miyahara , Shou Takashima , Yasuhiko Sawazaki , Atsushi Iwasaki
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-252747 20131206
- International Application: PCT/JP2014/005672 WO 20141112
- International Announcement: WO2015/083323 WO 20150611
- Main IPC: C30B15/10
- IPC: C30B15/10 ; C30B29/06 ; C03C3/04 ; C30B15/30 ; C30B30/04

Abstract:
Method for manufacturing a single crystal according to a CZ method, including: pre-examining a correlation between an Al/Li ratio in a quartz raw material powder used for producing the quartz crucible, a use time of the crucible, a devitrification ratio at the use time, and occurrence or nonoccurrence of melt leakage attributable to the devitrification part; setting a range of the devitrification ratio of the quartz crucible in order not to generate the melt leakage, and determining a maximum use time of the quartz crucible according to the Al/Li ratio so as to fall within the set range of the ratio, on the basis of the correlation; and growing the single crystal by using the quartz crucible in the range of the maximum use time. This provides a manufacturing method which can efficiently use a quartz crucible to grow a single crystal while preventing occurrence of melt leakage.
Public/Granted literature
- US20160289861A1 METHOD FOR MANUFACTURING SINGLE CRYSTAL Public/Granted day:2016-10-06
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