Invention Grant
- Patent Title: Illumination apparatus, pattern irradiation device, and system
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Application No.: US14879427Application Date: 2015-10-09
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Publication No.: US09863759B2Publication Date: 2018-01-09
- Inventor: Tatsuya Takahashi , Kazuhiro Fujita , Toshiharu Murai , Takehiro Nishimori , Takahiro Kado , Jun Kishiwada
- Applicant: Tatsuya Takahashi , Kazuhiro Fujita , Toshiharu Murai , Takehiro Nishimori , Takahiro Kado , Jun Kishiwada
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD.
- Current Assignee: RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-212747 20141017; JP2015-052453 20150316
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01B11/25 ; B25J9/16 ; F21V3/04 ; F21V7/00 ; F21Y115/10

Abstract:
An illumination apparatus includes: a light emitting unit that outputs light; a light condensing unit that condenses the light output from the light emitting unit; a diffusion unit that diffuses the light condensed by the light condensing unit; and a uniformizing optical system that receives the light diffused by the diffusion unit, uniformizes a brightness distribution thereof compared with that of the light being received, and outputs the resulting light.
Public/Granted literature
- US20160109221A1 ILLUMINATION APPARATUS, PATTERN IRRADIATION DEVICE, AND SYSTEM Public/Granted day:2016-04-21
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