Invention Grant
- Patent Title: Laser annealing and electric field
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Application No.: US15091247Application Date: 2016-04-05
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Publication No.: US09864276B2Publication Date: 2018-01-09
- Inventor: Christine Y. Ouyang , Ludovic Godet , Sang Ki Nam
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/027
- IPC: H01L21/027 ; G03F7/20 ; G03F7/16
Abstract:
A method and apparatus for exposing a photoresist in the presence of an electric field using a high power continuous wave source as a radiation source is disclosed herein. In one embodiment, a processing region includes a stage, a translation mechanism, a continuous wave electromagnetic module, and plurality of electrode assemblies. The continuous wave electromagnetic module includes a continuous wave electromagnetic radiation source in the form of a high power continuous wave electromagnetic laser. An electric field is applied to the surface of the substrate using the plurality of electrode assemblies while the continuous wave electromagnetic radiation source selectively irradiates the surface of the substrate.
Public/Granted literature
- US20160299435A1 LASER ANNEALING AND ELECTRIC FIELD Public/Granted day:2016-10-13
Information query
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