Invention Grant
- Patent Title: Substrate holding method, substrate holding apparatus, exposure apparatus and exposure method
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Application No.: US14892336Application Date: 2013-05-23
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Publication No.: US09865494B2Publication Date: 2018-01-09
- Inventor: Go Ichinose
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- International Application: PCT/JP2013/064414 WO 20130523
- International Announcement: WO2014/188572 WO 20141127
- Main IPC: G03B27/58
- IPC: G03B27/58 ; H02K41/02 ; H01L21/687 ; G03F7/20 ; H01L21/683

Abstract:
A wafer holding apparatus for holding a wafer including a wafer holder on which the wafer is placed; and a lift pin that is configured to be lifted up and down with respect to the wafer holder in a direction along a normal line of a placement surface of the wafer, the lift pin includes a tip part, the tip part includes: a bottom part that forms a suction region for sucking a rear surface of the wafer; and a convex part that supports the rear surface of the wafer in the suction region. When a substrate is placed on a target position, it is possible to prevent a local deterioration of flatness of the substrate even if the substrate is large.
Public/Granted literature
- US20160111318A1 SUBSTRATE HOLDING METHOD, SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD Public/Granted day:2016-04-21
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