Invention Grant
- Patent Title: Nonvolatile resistance change element
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Application No.: US13967885Application Date: 2013-08-15
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Publication No.: US09865809B2Publication Date: 2018-01-09
- Inventor: Hidenori Miyagawa , Akira Takashima , Shosuke Fujii
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-160209 20110721
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00 ; H01L27/10 ; H01L27/24 ; G11C13/00

Abstract:
According to one embodiment, a nonvolatile resistance change element includes a first electrode, a second electrode and a first layer. The first electrode includes a metal element. The second electrode includes an n-type semiconductor. The first layer is formed between the first electrode and the second electrode and includes a semiconductor element. The first layer includes a conductor portion made of the metal element. The conductor portion and the second electrode are spaced apart.
Public/Granted literature
- US20130328008A1 NONVOLATILE RESISTANCE CHANGE ELEMENT Public/Granted day:2013-12-12
Information query
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