Invention Grant
- Patent Title: Method, apparatus, and system for adjusting emission parameter of laser in WDM-PON
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Application No.: US15264286Application Date: 2016-09-13
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Publication No.: US09866318B2Publication Date: 2018-01-09
- Inventor: Heng Wang , Zhiguang Xu , Enyu Zhou
- Applicant: Huawei Technologies Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Conley Rose, P.C.
- Main IPC: H04B17/00
- IPC: H04B17/00 ; H04B10/079 ; H04B10/071 ; H04B10/272 ; H04B10/564 ; H04B10/50 ; H04J14/02

Abstract:
A method includes monitoring a power value of output light of the laser and a power value of reflected light, obtaining an insertion loss value according to the power value of the output light, the power value of the reflected light, and a parameter of a Faraday rotation reflector, obtaining a bias current value according to the insertion loss value, and adjusting the power value of the output light of the laser using the bias current value. The insertion loss value is obtained by detecting the power value of the reflected light obtained after the output light of the laser is reflected. Because the insertion loss value is a power loss value, of the output light of the laser, on a one-way link between the laser and the Faraday rotation mirror.
Public/Granted literature
- US20170005728A1 Method, Apparatus, and System for Adjusting Emission Parameter of Laser in WDM-PON Public/Granted day:2017-01-05
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