Invention Grant
- Patent Title: Filled large-format imprinting method
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Application No.: US14475869Application Date: 2014-09-03
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Publication No.: US09867289B2Publication Date: 2018-01-09
- Inventor: Ronald Steven Cok
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Raymond L. Owens; Kevin E. Spaulding
- Main IPC: B29C33/42
- IPC: B29C33/42 ; H05K1/09 ; G02B5/20 ; G02B5/00 ; B29C35/08 ; B29C59/00 ; B29C59/02 ; G02F1/1335 ; H05K1/11 ; G03F7/00 ; B29K105/24 ; B29L31/34

Abstract:
A method of making a filled large-format imprinted structure includes providing a substrate, locating a curable layer over the substrate, imprinting the curable layer, and curing the curable layer to form a cured layer including a layer surface having one or more areas. Each area has a plurality of imprinted micro-cavities, wherein each micro-cavity has a micro-cavity width less than or equal to 20 microns. A rib separates each micro-cavity from an adjacent micro-cavity by a rib width that is less than the micro-cavity width, the rib extending from a bottom of the micro-cavity to the layer surface. A common curable material is located in each micro-cavity and cured to form common cured material in each micro-cavity, thereby defining a filled large-format imprinted structure.
Public/Granted literature
- US20160062004A1 FILLED LARGE-FORMAT IMPRINTING METHOD Public/Granted day:2016-03-03
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