Invention Grant
- Patent Title: Selective segment via plating process and structure
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Application No.: US14834205Application Date: 2015-08-24
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Publication No.: US09867290B2Publication Date: 2018-01-09
- Inventor: Kwan Pen , Pui Yin Yu
- Applicant: Multek Technologies Ltd.
- Applicant Address: US CA San Jose
- Assignee: Multek Technologies Limited
- Current Assignee: Multek Technologies Limited
- Current Assignee Address: US CA San Jose
- Agency: Haverstock & Owens LLP
- Priority: CN201510121886 20150319; CN201510127856 20150323
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/11 ; H05K3/42 ; H05K3/46 ; H05K3/00 ; H05K3/06 ; H05K3/18

Abstract:
A selective segment via plating process for manufacturing a circuit board selectively interconnects inner conductive layers as separate segments within the same via. Plating resist is applied to a conductive layer of an inner core and then stripped off after an electroless plating process. Stripping of the electroless plating on the plating resist results in a plating discontinuity on the via wall. In a subsequent electroplating process, the plug non-conductive layer can not be plated due to the plating discontinuity. The resulting circuit board structure has separate electrically interconnected segments within the via.
Public/Granted literature
- US20160278208A1 SELECTIVE SEGMENT VIA PLATING PROCESS AND STRUCTURE Public/Granted day:2016-09-22
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