Invention Grant
- Patent Title: Block copolymers for directed self-assembly applications
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Application No.: US14919070Application Date: 2015-10-21
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Publication No.: US09879152B2Publication Date: 2018-01-30
- Inventor: Noel Arellano , Joy Cheng , Teddie P. Magbitang , Jed W. Pitera , Daniel P. Sanders , Kristin Schmidt , Hoa D. Truong , Ankit Vora
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Michael R. Roberts
- Main IPC: C09D153/00
- IPC: C09D153/00 ; C09D169/00 ; C09D167/04 ; C09D125/08 ; C08G63/64 ; C08G63/08 ; C08J7/04 ; C08G64/18 ; C08F212/08 ; G03F7/00

Abstract:
Block copolymers (BCPs) for self-assembly applications comprise a linear fluorinated linking group L′ joining a pair of adjacent blocks. A film layer comprising a BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented domain pattern when the underlayer is preferentially wetted by one domain of an otherwise identical self-assembled BCP in which all fluorines of L′ are replaced by hydrogen. The BCP can be a low-chi or high-chi BCP. In a preferred embodiment, the BCP comprises a styrene-based first block, and a second block comprises a carbonate and/or ester repeat unit formed by ring opening polymerization of a cyclic carbonate and/or cyclic ester monomer. The linking group L′ has a lower surface energy than each of the polymer blocks.
Public/Granted literature
- US20170114246A1 BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS Public/Granted day:2017-04-27
Information query
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