Invention Grant
- Patent Title: Pellicle and exposure mask including the same
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Application No.: US14849235Application Date: 2015-09-09
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Publication No.: US09880462B2Publication Date: 2018-01-30
- Inventor: Jae-hyuck Choi , Jin-su Kim , Kyoung-mi Kim , Byung-gook Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0010030 20150121
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64
Abstract:
A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.
Public/Granted literature
- US20160154299A1 PELLICLE AND EXPOSURE MASK INCLUDING THE SAME Public/Granted day:2016-06-02
Information query
